Evactron plasma decontaminators, Model E50-TC

The Evactron E50 E-TC Plasma De-contaminator was designed for facilities that prefer a tethered touchpad interface for programming. Evactron plasma cleaners remove hydrocarbon contamination from vacuum chambers such as SEMs, FIBs, TEMs, XPS and semiconductor equipment including CD-SEMs, ALD and EUVL. Its compact design fits all models of FIB/SEM chambers and loadlocks to provide in-situ sample cleaning. Evactron plasma cleaning shortens pumpdown time, maintains the ultimate vacuum level of your system and increases sample throughput with powerful yet thorough contamination removal. Available for use with various SEMs, ultra filter and alternate gas configuration.Features:Dual action cleaning by means of plasma and UV afterglowEnergy efficient hollow cathode RF plasma“POP” Ignition (patent pending) at high vacuum for instant ignitionProgrammable power, cleaning time, number of cycles, recipes...

The Evactron E50 E-TC Plasma De-contaminator was designed for facilities that prefer a tethered touchpad interface for programming. Evactron plasma cleaners remove hydrocarbon contamination from vacuum chambers such as SEMs, FIBs, TEMs, XPS and semiconductor equipment including CD-SEMs, ALD and EUVL. Its compact design fits all models of FIB/SEM chambers and loadlocks to provide in-situ sample cleaning. Evactron plasma cleaning shortens pumpdown time, maintains the ultimate vacuum level of your system and increases sample throughput with powerful yet thorough contamination removal. Available for use with various SEMs, ultra filter and alternate gas configuration.

Features:

  • Dual action cleaning by means of plasma and UV afterglow
  • Energy efficient hollow cathode RF plasma
  • “POP” Ignition (patent pending) at high vacuum for instant ignition
  • Programmable power, cleaning time, number of cycles, recipes
  • Android tablet with Bluetooth communication or RS-232 serial interface
  • Wide range pressure operation: 0.3Pa/2mTorr to 80Pa/600mTorr
  • TMP compatible, no advance venting needed
  • Fast cleaning, 60X+ faster than earlier generation Evactron models
  • Non-damaging to sensitive components – no sputter etch
  • Compact Plasma Radical Source fits on accessory-laden chambers
  • Simple pushbutton cleaning operation
  • No match or gas flow adjustments needed for plasma ignition or operation.
  • Optional external operation hardwire interlock connection
  • CE/TUV/NRTL safety certified
  • RoHS Compliant

Specifications:

  • Remote hollow cathode plasma radical source
  • Desktop controller with pushbutton operation
  • Tethered touchpad communication
  • Library of tested recipes and options to change power, cycles, length of cleaning, etc.
  • Chassis dimensions (W x H x D): 43 x 8.6 x 17cm
  • RF Power: 35 – 75W at 13.56 MHz RFHC
  • Electrical: 100-240 VAC 50/60 HZ input
  • Compliance: RoHS, CE, NRTL, TUV and SEMI S2 compliant
Updated: 18-07-2025
Code Type Pack Size Availability Price Updated: 18-07-2025
EMS91000-27 E50-TC, Hitachi/JEOL Each 0 in stock (?) P.O.R. Quote
EMS91000-28 E50-TC, FEI/Tescan/Zeiss Each 0 in stock (?) P.O.R. Quote
EMS91000-29 E50-TC, ultra filter Each 0 in stock (?) P.O.R. Quote
EMS91000-30 E50-TC, alternate gas feed Each 0 in stock (?) P.O.R. Quote