SPM calibration specimens, 300-2D

SPM calibration specimens are produced by holographic fabrication and are accurate to 0.5%.

Features:

• Easier testing of your SPM.
• Improved accuracy of critical dimension measurements.
• Accuracy: 0.5% (1 std. dev.).
• Holographic fabrication - assures high accuracy and precision.
• Pattern height > 100nm - provide excellent image contrast.
• Uniform coverage of entire chip - save time (can image anywhere).

Description:

• Nominal calibrated dimensions: 300 or 700nm.
• Calibration certificate: supplied with each sample, stating the dimension to the nearest 1nm.
• Pattern types: 1- or 2—Dimensional. The calibrated dimension is the same for both axes for the 2-D standard.
• Feature geometry:
  -parallel ridges (1-D, 300 or 700nm)
  -cylindrical posts (2-D 300nm)
  -diamond-shaped posts (2-D 700nm)
• Physical Size: 3mm x 4mm x 0.5mm.
• Substrate: Silicon wafer.
• Top surface: Tungsten film.

The 1-D standards can be scanned using any AFM mode, including contact mode. The 2-D standards can be scanned using modes such as Tapping Mode, intermittent contact, and non-contact.

Models 300-2D

All mounted on 15 mm steel disk.

• Array of Posts
• Pitch 297
• Al bumps on Si
• use contact or TappingMode
• SEM pin

References

1. Pereira, D.E.D. & Claudio-da-Silva, Jr., E. “Improvement of AFM as an analytical Instrument for Residual Lignin Characterization” in: Proceedings International Symposium on Wood and Pulping Chemistry, Helsinki, Finland, June 1995.

2. Pereria, D.E.D, Chernoff, D., Claudio-da-Silva, Jr. E., & Cemuner, B.J., “The use of AFM to investigate the delignification process: Part I –AFM performance by differentiating pulping processes”, to be published.

300-2D, pattern: array of posts, nominal pitch: 300 nm, material: W-coated photoresist on Si.