GloQube Plus dual chamber glow discharge system, 230V/50Hz

The GloQube Plus Glow Discharge System for TEM Grids and surface modification is rapid and reliable. It is a cost-effective, compact and easy to use glow discharge system, designed to fulfil the needs of laboratories with TEM. Ideal for hydrophilisation and cleaning of TEM grids carbon support films including Formvar, Lacey Carbon, Holey Carbon, Continuous Carbon, Quantifoil for better sample spreading. The integrated system with two chambers enable the user maximum flexibility to choose which sample preparation technique they want to use: glow discharge in-air or in-chemical vapour, without downtime for cleaning or the risk of contamination and loss of samples.The in-chemical vapour glow discharge allows the user to control orientation and conformation. With automatic vapour control, the system ensures accurate concentrations of chemical vapour in the plasma, producing reliable and reproducible results. Two chambers designed into one easy to use package provides a smalle...

The GloQube Plus Glow Discharge System for TEM Grids and surface modification is rapid and reliable. It is a cost-effective, compact and easy to use glow discharge system, designed to fulfil the needs of laboratories with TEM. Ideal for hydrophilisation and cleaning of TEM grids carbon support films including Formvar, Lacey Carbon, Holey Carbon, Continuous Carbon, Quantifoil for better sample spreading. The integrated system with two chambers enable the user maximum flexibility to choose which sample preparation technique they want to use: glow discharge in-air or in-chemical vapour, without downtime for cleaning or the risk of contamination and loss of samples.

The in-chemical vapour glow discharge allows the user to control orientation and conformation. With automatic vapour control, the system ensures accurate concentrations of chemical vapour in the plasma, producing reliable and reproducible results. Two chambers designed into one easy to use package provides a smaller footprint for the workflow space and no cross-contamination between the chambers.

Benefits:

  • Short in-air cycle time
  • Second chamber for separating in-air and in-vapour processes
  • No cross-contamination between chambers due to post-process flush cycle
  • Automatic vapour delivery ensures reliable and reproducible results
  • Purge cycles reduce water vapour and oxygen concentrations, ensuring excellent yield of specifically orientated macromolecules
  • Adjustable slow vent time to minimise sample disturbance
  • Optional fast vent for rapid process times
  • Safe handling of reagent
  • Three level adjustable height sample stage ensures repeatable results

Key Features:

Glow discharge treatment for electron microscopy sample preparation

  • Automatic control of vapour and air introduction
  • Flush and purge cycles of vapour chamber and gas line
  • Two chambers for separate in-air and in-vapour processes without contamination*
  • Fully automatic
  • Loaded with typical standard recipes
  • Password protected user profiles and programmable user recipes
  • Negative and positive discharge modes
  • Single door for easy sample loading
  • Adjustable three height sample stage
  • Intuitive touch screen control
  • Safe vapour delivery using septum-sealed vials
  • Automatic valving between chambers to prevent cross-contamination
  • Fast and/or soft venting options
  • Extended warranty option
    * Only one chamber can be used at a time

Specifications:

Power and Processes
Plasma current 1-50mA
HV power supply 30W
Maximum voltage 800V
Electrode polarity – clean chamber DC glow positive DC glow negative
Electrode polarity – vapor chamber DC glow positive DC glow negative
Sample stage 125 x 100mm for two 25 x 75mm glass slides and a 36 place grid holder
Sample stage operational heights Adjustable 12.5mm, 22.5mm or 35mm
Pump hold time 0-72hr
Process time 1-900sec
Safety
Chamber vent inlets Filtered air inlets with slow vent options to minimise sample disturbance
On-board reagent storage Reagents are contained in sealed glass vials to minimise exposure to hazards
High voltage safety interlocks Hardware safety interlocked and software for process control
Vacuum
Vacuum control Integrated pirani gauge
Working vacuum range 0.1 to 1mbar
Pump minimum requirements 5 m3/hr inlet flange: KF 16
Pumping time Typical pump time to an operational vacuum of 0.1mbar in less than 60 seconds
Vacuum isolation Isolation valves to switch vacuum and prevent process chamber cross-contamination
User Interface - Dimensions and Communications
Instrument size 336mm H x 364mm D x 336mm H
Instrument weight 19.4kg
Pump* 391mm W x 127mm D x 177mm H
Pump weight 16kg
Footprint with pump 366mm W x 600mm D x 336mm H
Power requirements 120V/60Hz, 15 A or 230V/50Hz, 10 A
Instrument power rating 100-240V AC 60/50Hz 700VA including pump, IEC inlet
Pump power rating 115/230V 60/50Hz 450W
Communication port USB Port

*Note: The pump data is for the Pfeiffer DUO 6

Code Title Pack Size Availability Price Updated: 20-08-2022
EMSGLOQUBE PLUS GloQube Plus dual chamber glow discharge system, 230V/50Hz Each 4 weeks Quote only Quote